Precautions for the use of semiconductor cleanrooms

Some devices do not have specific requirements for the usage environment, so there are not many things to pay attention to when using them. However, some devices have specific requirements for the usage environment, so the requirements for the usage environment are also very high. Some corresponding devices will choose to be used in clean workshops. Next, let's learn about the precautions for using semiconductor cleanrooms.

1. It is necessary to ensure that dust only enters and exits the semiconductor clean room, so an environment with a pressure greater than atmospheric pressure must be maintained inside the clean room. This requires the use of large blowers to continuously supply air from the purified equipment into the clean room.

2. To maintain constant temperature and humidity, large air conditioning equipment must be used in conjunction with the front blower pressurization system. The air conditioner needs to be turned on for as long as the blower is pressurized.

3. The air flow direction of all purified equipment is mainly from top to bottom, so the indoor space design or machine placement of the clean workshop should avoid abruptness, reducing the chance and time for dust and other particles to circulate and stagnate in the clean workshop to a low level.

4. All building materials are mainly made of materials that are not prone to static electricity adsorption.

5. All people or things entering and leaving the clean room must wear matching dust-proof clothing, and they must go through an air shower to remove surface dust first.

6. The use of water in semiconductor cleanrooms is limited to deionized water. One is to prevent powder particles from contaminating the wafer in water, and the other is to prevent heavy metal ions from contaminating the charged carrier channels of the metal oxide semiconductor transistor structure in water, which affects the working characteristics of semiconductor components. Deionized water is a good solvent and cleaner, and its usage in the semiconductor industry is astonishing.

7. The gas source used in semiconductor cleanrooms, including those required for wafer drying and machine air pressure, requires 98% nitrogen gas. The nitrogen used for wafer drying even requires high-purity nitrogen at 99.8% or higher.

To fully utilize the role of semiconductor cleanrooms, it is necessary to follow the correct methods when using them. Nowadays, many places or industries consider using semiconductor cleanrooms because they are relatively clean and easy to use, so people are more willing to use such products.